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Title: An ultra-compact, high-throughput molecular beam epitaxy growth system

We present a miniaturized molecular beam epitaxy (miniMBE) system with an outer diameter of 206 mm, optimized for flexible and high-throughput operation. The three-chamber system, used here for oxide growth, consists of a sample loading chamber, a storage chamber, and a growth chamber. The growth chamber is equipped with eight identical effusion cell ports with linear shutters, one larger port for either a multi-pocket electron beam evaporator or an oxygen plasma source, an integrated cryoshroud, retractable beam-flux monitor or quartz-crystal microbalance, reflection high energy electron diffraction, substrate manipulator, main shutter, and quadrupole mass spectrometer. The system can be combined with ultrahigh vacuum (UHV) end stations on synchrotron and neutron beamlines, or equivalently with other complex surface analysis systems, including low-temperature scanning probe microscopy systems. Substrate handling is compatible with most UHV surface characterization systems, as the miniMBE can accommodate standard surface science sample holders. We introduce the design of the system, and its specific capabilities and operational parameters, and we demonstrate the epitaxial thin film growth of magnetoelectric Cr{sub 2}O{sub 3} on c-plane sapphire and ferrimagnetic Fe{sub 3}O{sub 4} on MgO (001)
Authors:
;  [1] ;  [2] ; ; ;  [3] ;  [4]
  1. Clarendon Laboratory, Department of Physics, University of Oxford, Oxford OX1 3PU (United Kingdom)
  2. (United Kingdom)
  3. CreaTec Fischer and Co. GmbH, Industriestr. 9, 74391 Erligheim (Germany)
  4. Dr. Gassler Electron Devices GmbH, List Str. 4, 89079 Ulm (Germany)
Publication Date:
OSTI Identifier:
22392460
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 86; Journal Issue: 4; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; CHROMIUM OXIDES; ELECTRON BEAMS; ELECTRON DIFFRACTION; IRON OXIDES; MAGNESIUM OXIDES; MANIPULATORS; MASS SPECTROMETERS; MICROBALANCES; MOLECULAR BEAM EPITAXY; SAPPHIRE; SUBSTRATES