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Title: Note: A stand on the basis of atomic force microscope to study substrates for imaging optics

A description of a stand based on atomic force microscopy (AFM) for roughness measurements of large optical components with arbitrary surfaces is given. The sample under study is mounted on a uniaxial goniometer which allows the sample to be tilted in the range of ±30°. The inclination enables the local normal along the axis of the probe to be established at any point of the surface under study. A comparison of the results of the measurement of noise and roughness of a flat quartz sample, in the range of spatial frequencies 0.025–70 μm{sup −1}, obtained from “standard” AFM and developed versions is given. Within the experimental error, the measurement results were equivalent. Examples of applications of the stand for the study of substrates for X-ray optics are presented.
Authors:
; ;  [1]
  1. Department of Multilayer Optics, Institute for Physics of Microstructures of the Russian Academy of Sciences, GSP-105, 603950 Nizhny Novgorod (Russian Federation)
Publication Date:
OSTI Identifier:
22392336
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 86; Journal Issue: 1; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ATOMIC FORCE MICROSCOPY; ERRORS; GONIOMETERS; INCLINATION; NOISE; OPTICS; PROBES; QUARTZ; ROUGHNESS; SUBSTRATES; SURFACES; X RADIATION