Note: Development of a volume-limited dot target for a high brightness extreme ultraviolet microplasma source

Journal Article · Sat Nov 15 00:00:00 EST 2014 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4901934· OSTI ID:22392249

Suzuki, Yuhei; Hara, Hiroyuki; Higashiguchi, Takeshi ^[1]; Hirose, Ryoichi ^[2]; Ohashi, Hayato ^[3]; Li, Bowen; Dunne, Padraig; O’Sullivan, Gerry ^[4]; Sunahara, Atsushi ^[5]

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1. Department of Advanced Interdisciplinary Sciences and Center for Optical Research (CORE), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585 (Japan)
2. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan)
3. Graduate School of Science and Engineering for Research, University of Toyama, Toyama, Toyama 930-8555 (Japan)
4. School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland)
5. Institute for Laser Technology, 2-6 Yamada-oka, Suita, Osaka 565-0871 (Japan)

We report on production of volume-limited dot targets based on electron beam lithographic and sputtering technologies for use in efficient high brightness extreme ultraviolet microplasma sources. We successfully produced cylindrical tin (Sn) targets with diameters of 10, 15, and 20 μm and a height of 150 nm. The calculated spectrum around 13.5 nm was in good agreement with that obtained experimentally.

• OSTI ID: 22392249
• Journal Information: Review of Scientific Instruments, Vol. 85, Issue 11; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
BRIGHTNESS
CYLINDRICAL CONFIGURATION
ELECTRON BEAMS
EXTREME ULTRAVIOLET RADIATION
HEIGHT
SPECTRA
SPUTTERING
TIN