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Title: Design and construction of a research atomic layer deposition system for in situ infrared and electron spectroscopies

A description is given of an ultra-high vacuum surface-analysis chamber that incorporates an internal cell for performing atomic layer deposition at a pressure of up to ∼1 Torr. The apparatus permits the growth process to be interrupted in stages during which data can be obtained using infrared and x-ray photoemission spectroscopies together with other electron-based techniques. Demonstration results are given for the adsorption of H{sub 2}O on Si (100) at a pressure of ∼0.3 Torr. The system described is generally applicable in the study of any surface reaction under non-high-vacuum conditions in which there is a need for both infrared and electron spectroscopies.
Authors:
 [1]
  1. Electronics Science and Technology Division, Naval Research Laboratory, Washington, DC 20375 (United States)
Publication Date:
OSTI Identifier:
22392240
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 11; Other Information: (c) 2014 U.S. Government; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ADSORPTION; CONSTRUCTION; DESIGN; ELECTRONS; EQUIPMENT; LICENSES; PHOTOELECTRON SPECTROSCOPY; PRESSURE RANGE PA; SURFACES; WATER; X RADIATION