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Title: Resputtering effect during MgO buffer layer deposition by magnetron sputtering for superconducting coated conductors

In this study, MgO thin films were deposited by radio-frequency magnetron sputtering. The film thickness in the deposition area directly facing the target center obviously decreased compared with that in other areas. This reduction in thickness could be attributed to the resputtering effect resulting from bombardment by energetic particles mainly comprising oxygen atoms and negative oxygen ions. The influences of deposition position and sputtering pressure on the deposition rate were investigated. Resputtering altered the orientation of the MgO film from (111) to (001) when the film was deposited on a single crystal yttria-stabilized zirconia substrate. The density distribution of energetic particles was calculated on the basis of the measured thicknesses of the MgO films deposited at different positions. The divergence angle of the energetic particle flux was estimated to be approximately 15°. The energetic particle flux might be similar to the assisting ion flux in the ion beam assisted deposition process and could affect the orientation of the MgO film growth.
Authors:
; ; ;  [1] ; ;  [2] ; ;  [3] ;  [4]
  1. Applied Superconductivity Research Center, Department of Physics, Tsinghua University, Beijing 100084 (China)
  2. Division of Advanced Manufacturing, Graduate School at Shenzhen, Tsinghua University, Shenzhen 518055 (China)
  3. Department of Mechanical Engineering, Tsinghua University, Beijing 100084 (China)
  4. School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006 (China)
Publication Date:
OSTI Identifier:
22392198
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 4; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; DEPOSITION; LAYERS; MAGNESIUM OXIDES; MAGNETRONS; MONOCRYSTALS; RADIOWAVE RADIATION; SPUTTERING; SUBSTRATES; THICKNESS; THIN FILMS; YTTRIUM OXIDES; ZIRCONIUM OXIDES