skip to main content

SciTech ConnectSciTech Connect

Title: Structure and interfacial analysis of nanoscale TiNi thin film prepared by biased target ion beam deposition

Ultrathin, 65 nm thick, TiNi alloy films were fabricated by cosputtering Ti and Ni targets using the recently developed biased target ion beam deposition technique. Preheating the substrate by exposure to a low energy ion source resulted in as-deposited films with a pure B2 atomic crystal structure containing no secondary crystal structures or precipitates. Continuous films were produced with a smooth surface and minimal substrate/film interfacial diffusion. The diffusion layer was a small ratio of film thickness, which is a prerequisite for the B2 phase to undergo the martensitic transformation in ultrathin films.
Authors:
; ;  [1]
  1. Department of Engineering Science and Mechanics, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States)
Publication Date:
OSTI Identifier:
22392189
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 4; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; ALLOYS; CRYSTAL STRUCTURE; DEPOSITION; DEPOSITS; DIFFUSION; HEAT TREATMENTS; ION BEAMS; LAYERS; NANOSTRUCTURES; PHASE TRANSFORMATIONS; SUBSTRATES; SURFACES; THICKNESS; THIN FILMS