High power pulsed magnetron sputtering: A method to increase deposition rate
- Center for Plasma Material Interactions, University of Illinois, Urbana, Illinois 61801 (United States)
- Center for Plasma Material Interactions, University of Illinois, Urbana, Illinois 61801 and National Nuclear Research University MEPhI (Moscow Engineering Physics Institute), Moscow 115409 (Russian Federation)
High power pulsed magnetron sputtering (HPPMS) is a state-of-the-art physical vapor deposition technique with several industrial applications. One of the main disadvantages of this process is its low deposition rate. In this work, the authors report a new magnetic field configuration, which produces deposition rates twice that of conventional magnetron's dipole magnetic field configuration. Three different magnet pack configurations are discussed in this paper, and an optimized magnet pack configuration for HPPMS that leads to a higher deposition rate and nearly full-face target erosion is presented. The discussed magnetic field produced by a specially designed magnet assembly is of the same size as the conventional magnet assembly and requires no external fields. Comparison of deposition rates with different power supplies and the electron trapping efficiency in complex magnetic field arrangements are discussed.
- OSTI ID:
- 22392170
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 33, Issue 3; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
Similar Records
Deposition rates of high power impulse magnetron sputtering: Physics and economics
Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics