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Title: Surface structure and surface kinetics of InN grown by plasma-assisted atomic layer epitaxy: A HREELS study

The surface bonding configuration and kinetics of hydrogen desorption from InN grown by plasma-assisted atomic layer epitaxy have been investigated. High resolution electron energy loss spectra exhibited loss peaks assigned to a Fuchs–Kliewer surface phonon, N-N and N-H surface species. The surface N-N vibrations are attributed to surface defects. The observation of N-H but no In-H surface species suggested N-terminated InN. Isothermal desorption data were best fit by the first-order desorption kinetics with an activation energy of (0.88 ± 0.06) eV and pre-exponential factor of (1.5 ± 0.5) × 10{sup 5 }s{sup −1}.
Authors:
 [1] ;  [2] ;  [3] ;  [4]
  1. Department of Physics, Georgia Southern University, Statesboro, Georgia 30460 (United States)
  2. Department of Physics and Astronomy, Georgia State University, Atlanta, Georgia 30303 (United States)
  3. American Association for Engineering Education, 1818 N Street NW, Washington, DC 20034 (United States)
  4. Electronics Science and Technology Division, U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375 (United States)
Publication Date:
OSTI Identifier:
22392144
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 2; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; ACTIVATION ENERGY; BONDING; DESORPTION; ELECTRONS; ENERGY-LOSS SPECTROSCOPY; EPITAXY; INDIUM NITRIDES; KINETICS; LAYERS; PLASMA; SURFACES