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Title: Electromagnetic effects in high-frequency large-area capacitive discharges: A review

In traditional capacitively coupled plasmas, the discharge can be described by an electrostatic model, in which the Poisson equation is employed to determine the electrostatic electric field. However, current plasma reactors are much larger and driven at a much higher frequency. If the excitation wavelength λ in the plasma becomes comparable to the electrode radius, and the plasma skin depth δ becomes comparable to the electrode spacing, the electromagnetic (EM) effects will become significant and compromise the plasma uniformity. In this regime, capacitive discharges have to be described by an EM model, i.e., the full set of Maxwell's equations should be solved to address the EM effects. This paper gives an overview of the theory, simulation and experiments that have recently been carried out to understand these effects, which cause major uniformity problems in plasma processing for microelectronics and flat panel display industries. Furthermore, some methods for improving the plasma uniformity are also described and compared.
Authors:
; ;  [1] ;  [2]
  1. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
  2. Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, BE-2610 Wilrijk-Antwerp (Belgium)
Publication Date:
OSTI Identifier:
22392130
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 2; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; COMPARATIVE EVALUATIONS; DEPTH; ELECTRIC FIELDS; ELECTRODES; EXCITATION; MAXWELL EQUATIONS; MICROELECTRONICS; PLASMA; POISSON EQUATION; REVIEWS; SIMULATION; WAVELENGTHS