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Title: Enhanced photocatalytic performance in atomic layer deposition grown TiO{sub 2} thin films via hydrogen plasma treatment

The authors report the effect of hydrogen plasma treatment on TiO{sub 2} thin films grown by atomic layer deposition as an effective approach for modifying the photoanode materials in order to enhance their photoelectrochemical performance. Hydrogen plasma treated TiO{sub 2} thin films showed an improved absorption in the visible spectrum probably due to surface reduction. XPS analysis confirmed the formation of Ti{sup 3+} states upon plasma treatment. Hydrogen plasma treatment of TiO{sub 2} films enhanced the measured photocurrent densities by a factor of 8 (1 mA/cm{sup 2} at 0.8 V versus normal hydrogen electrode) when compared to untreated TiO{sub 2} (0.12 mA/cm{sup 2}). The enhancement in photocurrent is attributed to the formation of localized electronic states in mid band-gap region, which facilitate efficient separation and transportation of photo excited charge carriers in the UV region of electromagnetic spectrum.
Authors:
; ; ;  [1] ;  [2]
  1. Institute of Inorganic Chemistry, University of Cologne, Greinstrasse 6, Cologne 50939 (Germany)
  2. Department of Chemistry, Technische Universit├Ąt Berlin, Berlin 10623 (Germany)
Publication Date:
OSTI Identifier:
22392124
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; ABSORPTION; CHARGE CARRIERS; ELECTRODES; HYDROGEN; PERFORMANCE; PHOTOCATALYSIS; PLASMA; SURFACES; THIN FILMS; TITANIUM IONS; TITANIUM OXIDES; VISIBLE SPECTRA; X-RAY PHOTOELECTRON SPECTROSCOPY