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Title: Infrared and thermoelectric power generation in thin atomic layer deposited Nb-doped TiO{sub 2} films

Infrared radiation is used to radiatively transfer heat to a nanometric power generator (NPG) device with a thermoelectric Nb-doped TiO{sub 2} film deposited by atomic layer deposition (ALD) as the active element, onto a borosilicate glass substrate. The linear rise of the produced voltage with respect to the temperature difference between the “hot” and “cold” junctions, typical of the Seebeck effect, is missing. The discovery of the violation of the Seebeck effect in NPG devices combined with the ability of ALD to tune thermoelectric thin film properties could be exploited to increase the efficiency of these devices for energy harvesting purposes.
Authors:
; ; ;  [1] ; ;  [2]
  1. Department of Physics and Astronomy, James Madison University, 901 Carrier Drive, Harrisonburg, Virginia 22807 (United States)
  2. Department of Chemistry, Aalto University, P.O. Box 16100, Aalto, 00076 Finland (Finland)
Publication Date:
OSTI Identifier:
22392097
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; BOROSILICATE GLASS; DEPOSITION; DEPOSITS; DOPED MATERIALS; EFFICIENCY; ELECTRIC POTENTIAL; HEAT; INFRARED RADIATION; LAYERS; NANOSTRUCTURES; RADIANT HEAT TRANSFER; SEEBECK EFFECT; THIN FILMS; TITANIUM OXIDES