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Title: In situ Raman spectroscopy for growth monitoring of vertically aligned multiwall carbon nanotubes in plasma reactor

Portable and highly sensitive Raman setup was associated with a plasma-enhanced chemical vapor deposition reactor enabling in situ growth monitoring of multi-wall carbon nanotubes despite the combination of huge working distance, high growth speed and process temperature and reactive plasma condition. Near Edge X-ray absorption fine structure spectroscopy was used for ex situ sample analysis as a complementary method to in situ Raman spectroscopy. The results confirmed the fact that the “alternating” method developed here can accurately be used for in situ Raman monitoring under reactive plasma condition. The original analytic tool can be of great importance to monitor the characteristics of these nanostructured materials and readily define the ultimate conditions for targeted results.
Authors:
; ; ; ; ;  [1] ; ; ; ;  [2] ;  [3]
  1. GREMI, Université-CNRS, BP6744, 45067 Orléans Cedex 2 (France)
  2. CNRS, CEMHTI UPR3079, Univ. Orléans, F-45071 Orléans Cedex 2 (France)
  3. Institute of Material Science, Chritian-Albrechts-University of Kiel, D-24143 Kiel (Germany)
Publication Date:
OSTI Identifier:
22392073
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 105; Journal Issue: 21; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ABSORPTION SPECTROSCOPY; CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; FINE STRUCTURE; PLASMA; RAMAN SPECTROSCOPY; X-RAY SPECTROSCOPY