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Title: Fabrication of triangular nanobeam waveguide networks in bulk diamond using single-crystal silicon hard masks

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4902562· OSTI ID:22392049
; ; ; ; ; ; ; ;  [1]; ; ;  [2];  [3];  [4]
  1. Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Building 36, Cambridge, Massachusetts 02139 (United States)
  2. Brookhaven National Laboratory, Center for Functional Nanomaterials, Upton, New York 11973 (United States)
  3. Department of Electrical Engineering and Microelectronics Research Center, Technion, Haifa 32000 (Israel)
  4. Department of Physics and Solid State Institute, Technion, Haifa 32000 (Israel)

A scalable approach for integrated photonic networks in single-crystal diamond using triangular etching of bulk samples is presented. We describe designs of high quality factor (Q = 2.51 × 10{sup 6}) photonic crystal cavities with low mode volume (V{sub m} = 1.062 × (λ/n){sup 3}), which are connected via waveguides supported by suspension structures with predicted transmission loss of only 0.05 dB. We demonstrate the fabrication of these structures using transferred single-crystal silicon hard masks and angular dry etching, yielding photonic crystal cavities in the visible spectrum with measured quality factors in excess of Q = 3 × 10{sup 3}.

OSTI ID:
22392049
Journal Information:
Applied Physics Letters, Vol. 105, Issue 21; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English