Ionization sensitization of doping in co-deposited organic semiconductor films
- Institute for Molecular Science, 5-1 Higashiyama, Myodaiji, Okazaki 444-8787, Aichi (Japan)
Sensitization of the dopant ionization in co-deposited films of organic semiconductors was found. The ionization rate of cesium carbonate (Cs{sub 2}CO{sub 3}), which acts as a donor dopant in single films of metal-free phthalocyanine (H{sub 2}Pc) and fullerene (C{sub 60}), was increased from 10% to 97% in a H{sub 2}Pc:C{sub 60} co-deposited film. A charge separation superlattice model that includes electron transfer from the conduction band of H{sub 2}Pc to that of C{sub 60}, which increases the rate of dopant ionization, is proposed.
- OSTI ID:
- 22391916
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 18; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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