Protection of MoO{sub 3} high work function by organic thin film
- Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627 (United States)
The effects of air exposure are investigated for molybdenum trioxide (MoO{sub 3}) covered with organic thin films using ultraviolet photoemission spectroscopy. It is found that the severe drop of the work function of MoO{sub 3} by air exposure is substantially reduced by the organic thin films. Both CuPc and C{sub 60} are used for the investigations. The results indicate that the MoO{sub 3} surface can be passivated by approximately two monolayers of organic thin films against exposure to air.
- OSTI ID:
- 22391899
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 18; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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