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Title: Semi-analytical modeling of the NIO1 source

NIO1 is a compact and versatile negative ion source, with a total current of 130 mA accelerated to 60 keV. Negative ions are created inside the plasma, which is inductively coupled to an external rf cylindrical coil operating in the range of 2 ± 0.2 MHz. The plasma is confined in the source chamber (a 50 mm radius cylinder) by a multipole magnetic field and the ions are extracted through a 3x3 matrix of apertures. The use of cesium, to enhance the negative ion production by H{sub 0} bombardment of the surfaces, is foreseen in a second stage of the operation, so that at present time the source is operating in pure volume configuration. This paper presents a model aimed to describe the main physical phenomena occurring in the source, focusing on the rf coupling with the plasma and the evolution of plasma parameters in the source. With respect to more sophisticated models of negative ion sources here we aimed to develop a fast tool capable of qualitatively describing the response of the system to variations in the basic operating parameters. The findings of this models is finally compared with the first experimental results of NIO1.
Authors:
 [1] ;  [2] ; ;  [3]
  1. Universitá degli Studi di Padova, Via 8 febbraio 2, I-35122 Padova (Italy)
  2. INFN-LNL, viale dellâĂŹUniversitá n. 2, 35020 Legnaro (Italy)
  3. Consorzio RFX (CNR, ENEA, INFN, Universitá di Padova, Acciaierie Venete SpA) Corso Stati Uniti 4, 35127 Padova (Italy)
Publication Date:
OSTI Identifier:
22391405
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1655; Journal Issue: 1; Conference: NIBS 2014: 4. International Symposium on Negative Ions, Beams and Sources, Garching (Germany), 6-10 Oct 2014; Other Information: (c) 2015 U.S. Government; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ANIONS; CESIUM; COMPARATIVE EVALUATIONS; CYLINDRICAL CONFIGURATION; ELECTRIC CURRENTS; ION SOURCES; KEV RANGE; MAGNETIC FIELDS; MHZ RANGE; PLASMA; PLASMA CONFINEMENT; RF SYSTEMS