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Title: A simple solution to the problem of effective utilisation of the target material for pulsed laser deposition of thin films

The factors determining the efficiency of the target material utilisation for pulsed laser deposition of films are considered. The target volume is calculated, which is evaporated in the ablation process by the focused laser radiation having a rectangular form. The new device is suggested and developed for obtaining thin films by the method of laser deposition, which is specific in the employment of a simple optical system mounted outside a deposition chamber that comprises two lenses and the diaphragm and focuses the laser beam onto a target in the form of a sector-like spot. Thin films of CuO and YBaCuO were deposited with this device. Several deposition cycles revealed that the target material is consumed uniformly from the entire surface of the target. A maximal spread of the target thickness was not greater than ±2% both prior to deposition and after it. The device designed provides a high coefficient of the target material utilisation efficiency. (laser deposition of thin films)
Authors:
; ;  [1] ; ;  [2]
  1. Institute of Physics Research, Armenian Academy of Sciences, Ashtarak-2 (Armenia)
  2. P N Lebedev Physics Institute, Russian Academy of Sciences, Moscow (Russian Federation)
Publication Date:
OSTI Identifier:
22373658
Resource Type:
Journal Article
Resource Relation:
Journal Name: Quantum Electronics (Woodbury, N.Y.); Journal Volume: 43; Journal Issue: 12; Other Information: Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BARIUM OXIDES; COPPER OXIDES; EFFICIENCY; ENERGY BEAM DEPOSITION; HIGH-TC SUPERCONDUCTORS; LASER RADIATION; LASERS; LENSES; OPTICAL SYSTEMS; PULSED IRRADIATION; SURFACES; THICKNESS; THIN FILMS; YTTRIUM OXIDES