Plasmonic nanoring fabrication tuned to pitch: Efficient, deterministic, and large scale realization of ultra-small gaps for next generation plasmonic devices

Journal Article · Mon Oct 06 00:00:00 EDT 2014 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4897497· OSTI ID:22351132

Lehr, D.; Dietrich, K.; Siefke, T.; Kley, E. -B. ^[1]; Alaee, R. ^[2]; Filter, R.; Lederer, F. ^[3]; Rockstuhl, C. ^[2]; Tünnermann, A. ^[1]

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1. Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, Max-Wien-Platz 1, 07743 Jena (Germany)
2. Institute of Theoretical Solid State Physics, Karlsruher Institut für Technologie, Wolfgang-Gaede-Str. 1, 76128 Karlsruhe (Germany)
3. Institute of Condensed Matter Theory and Solid State Optics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, Max-Wien-Platz 1, 07743 Jena (Germany)

A double-patterning process for scalable, efficient, and deterministic nanoring array fabrication is presented. It enables gaps and features below a size of 20 nm. A writing time of 3 min/cm{sup 2} makes this process extremely appealing for scientific and industrial applications. Numerical simulations are in agreement with experimentally measured optical spectra. Therefore, a platform and a design tool for upcoming next generation plasmonic devices like hybrid plasmonic quantum systems are delivered.

• OSTI ID: 22351132
• Journal Information: Applied Physics Letters, Vol. 105, Issue 14; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
COMPUTERIZED SIMULATION
FABRICATION
HYBRID SYSTEMS
NANOSTRUCTURES
PITCHES
PLASMONS
SPECTRA