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Title: Plasmonic nanoring fabrication tuned to pitch: Efficient, deterministic, and large scale realization of ultra-small gaps for next generation plasmonic devices

A double-patterning process for scalable, efficient, and deterministic nanoring array fabrication is presented. It enables gaps and features below a size of 20 nm. A writing time of 3 min/cm{sup 2} makes this process extremely appealing for scientific and industrial applications. Numerical simulations are in agreement with experimentally measured optical spectra. Therefore, a platform and a design tool for upcoming next generation plasmonic devices like hybrid plasmonic quantum systems are delivered.
Authors:
; ; ;  [1] ;  [2] ; ;  [3] ;  [2] ;  [4] ;  [1] ;  [4]
  1. Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, Max-Wien-Platz 1, 07743 Jena (Germany)
  2. Institute of Theoretical Solid State Physics, Karlsruher Institut für Technologie, Wolfgang-Gaede-Str. 1, 76128 Karlsruhe (Germany)
  3. Institute of Condensed Matter Theory and Solid State Optics, Abbe Center of Photonics, Friedrich-Schiller-University Jena, Max-Wien-Platz 1, 07743 Jena (Germany)
  4. (Germany)
Publication Date:
OSTI Identifier:
22351132
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 105; Journal Issue: 14; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; COMPUTERIZED SIMULATION; FABRICATION; HYBRID SYSTEMS; NANOSTRUCTURES; PITCHES; PLASMONS; SPECTRA