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Title: Energy dependence on formation of TiO{sub 2} nanofilms by Ti ion implantation and annealing

Graphical abstract: - Highlights: • Fabrication of TiO{sub 2} films by ion implantation and annealing strongly depends on ion energy. • Best photocatalytic activity is achieved in the TiO{sub 2} nanofilm annealed at 1000 °C. • Phase transformation of TiO{sub 2} appears under annealing temperature of 900 °C. - Abstract: TiO{sub 2} nanofilms were fabricated by a solid-phase-growth progress. The silica glass slides were implanted with Ti ions to the fluence of 1.84 × 10{sup 17} ions/cm{sup 2} at accelerate voltages of 20, 50, and 80 kV, respectively. The samples were annealed in oxygen atmosphere at 700, 800, 900, and 1000 °C for 4 h, respectively. The influence of the ion energy and the annealing temperature on the formation and phase transformation of the TiO{sub 2} films was studied. It was found that anatase TiO{sub 2} nanofilms instead of embedded rutile TiO{sub 2} nanoparticles on the substrate surfaces when the energy of implanted Ti atoms was 20 kV.
Authors:
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Publication Date:
OSTI Identifier:
22348618
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Research Bulletin; Journal Volume: 51; Other Information: Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANNEALING; CRYSTAL GROWTH; DIFFUSION; ELECTRIC POTENTIAL; ENERGY DEPENDENCE; NANOPARTICLES; OXYGEN; PHOTOCATALYSIS; RUTILE; SILICA; SOLIDS; SUBSTRATES; THIN FILMS; TITANIUM IONS; TITANIUM OXIDES