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Title: Microstructure evolution during annealing of TiAl/NiCoCrAl multilayer composite prepared by EB-PVD

TiAl/NiCoCrAl laminate composite sheet with a thickness of 0.4–0.6 mm as well as a dimension of 150 mm × 100 mm was fabricated successfully by using electron beam physical vapor deposition (EB-PVD) method. The annealing treatment was processed at 1123 and 1323 K for 3 h in a high vacuum atmosphere, respectively. The phase composition and microstructure of TiAl/NiCoCrAl microlaminated sheet have been analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Based on the sheet characterization and results of the microstructure evolution during annealing treatment process, the diffusion mechanism of interfacial reaction in TiAl/NiCoCrAl microlaminate was investigated and discussed.
Authors:
 [1] ;  [2] ;  [3] ;  [1]
  1. Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China)
  2. Beijing General Research Institute of Mining and Metallurgy, Beijing 100044 (China)
  3. Center for Composite Materials, Harbin Institute of Technology, Harbin 150001 (China)
Publication Date:
OSTI Identifier:
22340378
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Characterization; Journal Volume: 93; Other Information: Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANNEALING; DIFFUSION; ELECTRON BEAMS; LAYERS; MICROSTRUCTURE; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION