Microstructure evolution during annealing of TiAl/NiCoCrAl multilayer composite prepared by EB-PVD

Journal Article · Tue Jul 01 00:00:00 EDT 2014 · Materials Characterization

DOI:https://doi.org/10.1016/J.MATCHAR.2014.03.015· OSTI ID:22340378

Zhang, Rubing ^[1]; Zhang, Deming ^[2]; Chen, Guiqing ^[3]; Wang, Yuesheng ^[1]

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1. Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China)
2. Beijing General Research Institute of Mining and Metallurgy, Beijing 100044 (China)
3. Center for Composite Materials, Harbin Institute of Technology, Harbin 150001 (China)

TiAl/NiCoCrAl laminate composite sheet with a thickness of 0.4–0.6 mm as well as a dimension of 150 mm × 100 mm was fabricated successfully by using electron beam physical vapor deposition (EB-PVD) method. The annealing treatment was processed at 1123 and 1323 K for 3 h in a high vacuum atmosphere, respectively. The phase composition and microstructure of TiAl/NiCoCrAl microlaminated sheet have been analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Based on the sheet characterization and results of the microstructure evolution during annealing treatment process, the diffusion mechanism of interfacial reaction in TiAl/NiCoCrAl microlaminate was investigated and discussed.

• OSTI ID: 22340378
• Journal Information: Materials Characterization, Vol. 93; Other Information: Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1044-5803
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
DIFFUSION
ELECTRON BEAMS
LAYERS
MICROSTRUCTURE
PHYSICAL VAPOR DEPOSITION
SCANNING ELECTRON MICROSCOPY
TRANSMISSION ELECTRON MICROSCOPY
X-RAY DIFFRACTION