skip to main content

SciTech ConnectSciTech Connect

Title: Time-dependent dielectric breakdown measurements of porous organosilicate glass using mercury and solid metal probes

Time-dependent dielectric breakdown (TDDB) is one of the major concerns for low-k dielectric materials. During plasma processing, low-k dielectrics are subjected to vacuum ultraviolet photon radiation and charged-particle bombardment. To examine the change of TDDB properties, time-to-breakdown measurements are made to porous SiCOH before and after plasma exposure. Significant discrepancies between mercury and solid-metal probes are observed and have been shown to be attributed to mercury diffusion into the dielectric porosities.
Authors:
; ;  [1] ; ;  [2] ;  [3]
  1. Plasma Processing and Technology Laboratory, Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706 (United States)
  2. Intel Corporation, Hillsboro, Oregon 97124 (United States)
  3. Department of Electrical Engineering, Stanford University, Stanford, California 94305 (United States)
Publication Date:
OSTI Identifier:
22318040
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 32; Journal Issue: 5; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; BREAKDOWN; CHARGED PARTICLES; DIELECTRIC MATERIALS; MERCURY; ORGANIC SILICON COMPOUNDS; POROUS MATERIALS; ULTRAVIOLET RADIATION