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Title: Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

The fracture strength of Al{sub 2}O{sub 3} membranes deposited by atomic layer deposition at 110, 150, 200, and 300 °C was investigated. The fracture strength was found to be in the range of 2.25–3.00 GPa using Weibull statistics and nearly constant as a function of deposition temperature. This strength is superior to common microelectromechanical systems materials such as diamondlike carbon, SiO{sub 2}, or SiC. As-deposited membranes sustained high cycling pressure loads >10 bar/s without fracture. Films featured, however, significant reduction in the resistance to failure after annealing (800 °C) or high humidity (95%, 60 °C) treatments.
Authors:
; ;  [1] ; ;  [2] ;  [3]
  1. Department of Materials Science and Engineering, Aalto University, P.O. Box 16200, FI-00076 Aalto (Finland)
  2. VTT Technical Research Centre of Finland, P.O. Box 1000, FI-02044VTT (Finland)
  3. Department of Micro- and Nanosciences, Aalto University, P.O. Box 13500, 00076 Aalto (Finland)
Publication Date:
OSTI Identifier:
22317973
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; ALUMINIUM OXIDES; CARBON; DEPOSITION; FRACTURE PROPERTIES; FRACTURES; MEMBRANES; SILICON CARBIDES; SILICON OXIDES