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Title: Plasma dynamics in a discharge produced by a pulsed dual frequency inductively coupled plasma source

Using a Langmuir probe, time resolved measurements of plasma parameters were carried out in a discharge produced by a pulsed dual frequency inductively coupled plasma source. The discharge was sustained in an argon gas environment at a pressure of 10 mTorr. The low frequency (P{sub 2} {sub MHz}) was pulsed at 1 kHz and a duty ratio of 50%, while high frequency (P{sub 13.56} {sub MHz}) was maintained in the CW mode. All measurements were carried out at the center of the discharge and 20 mm above the substrate. The results show that, at a particular condition (P{sub 2} {sub MHz} = 200 W and P{sub 13.56} {sub MHz }= 600 W), plasma density increases with time and stabilizes at up to ∼200 μs after the initiation of P{sub 2} {sub MHz} pulse at a plasma density of (2 × 10{sup 17} m{sup −3}) for the remaining duration of pulse “on.” This stabilization time for plasma density increases with increasing P{sub 2} {sub MHz} and becomes ∼300 μs when P{sub 2} {sub MHz} is 600 W; however, the growth rate of plasma density is almost independent of P{sub 2} {sub MHz}. Interestingly, the plasma density sharply increases as the pulse is switched off and reaches a peakmore » value in ∼10 μs, then decreases for the remaining pulse “off-time.” This phenomenon is thought to be due to the sheath modulation during the transition from “pulse on” to “pulse off” and partly due to RF noise during the transition period. The magnitude of peak plasma density in off time increases with increasing P{sub 2} {sub MHz}. The plasma potential and electron temperature decrease as the pulse develops and shows similar behavior to that of the plasma density when the pulse is switched off.« less
Authors:
;  [1] ;  [2]
  1. Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)
  2. Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea and SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22317931
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 32; Journal Issue: 6; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ARGON; ELECTRIC DISCHARGES; LANGMUIR PROBE; PLASMA DENSITY; PLASMA POTENTIAL; PULSES