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Title: Structure and electronic properties of mixed (a + c) dislocation cores in GaN

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4893030· OSTI ID:22314606
 [1];  [2]
  1. Department Materials Science and Metallurgy, University of Cambridge, Charles Babbage Road, Cambridge CB3 0FS (United Kingdom)
  2. Department Materials, Imperial College London, Exhibition Road, London SW7 2AZ (United Kingdom)

Classical atomistic models and atomic-resolution scanning transmission electron microscopy studies of GaN films reveal that mixed (a + c)-type dislocations have multiple different core structures, including a dissociated structure consisting of a planar fault on one of the (12{sup ¯}10) planes terminated by two different partial dislocations. Density functional theory calculations show that all cores introduce localized states into the band gap, which affects device performance.

OSTI ID:
22314606
Journal Information:
Journal of Applied Physics, Vol. 116, Issue 6; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English

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