skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Fast atom diffraction from a β-Ga{sub 2}O{sub 3}(100) surface

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4892350· OSTI ID:22314475
; ;  [1]; ;  [2];  [3]
  1. Institut für Physik, Humboldt-Universität zu Berlin, Newtonstraße 15, D-12489 Berlin (Germany)
  2. Leibniz-Institut für Kristallzüchtung, Max-Born-Straße 2, D-12489 Berlin (Germany)
  3. Institut für Festkörperphysik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, D-07743 Jena (Germany)

Fast H, He atoms, and H{sub 2} molecules with projectile energies ranging from 200 eV up to 3 keV were scattered under a grazing angle of incidence from a clean and flat β-Ga{sub 2}O{sub 3}(100) surface. The bulk single crystal was grown by the Czochralski method and prepared via annealing under ultra-high vacuum conditions. For scattering along low-index directions, we observed defined diffraction patterns in the angular distributions for scattered projectiles. From the analysis of diffraction patterns, we derive the surface unit cell in good accord with the parameters b and c for the lattice of the bulk crystal and derive information on the termination of the surface.

OSTI ID:
22314475
Journal Information:
Applied Physics Letters, Vol. 105, Issue 5; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English

Similar Records

Gallium vacancy formation in oxygen annealed β-Ga2O3
Journal Article · Wed Jun 23 00:00:00 EDT 2021 · Journal of Applied Physics · OSTI ID:22314475

Single crystalline β-Ga{sub 2}O{sub 3} nanowires synthesized by thermal oxidation of GaSe layer
Journal Article · Wed May 15 00:00:00 EDT 2013 · Materials Research Bulletin · OSTI ID:22314475

Effect of postdeposition annealing on the electrical properties of β-Ga{sub 2}O{sub 3} thin films grown on p-Si by plasma-enhanced atomic layer deposition
Journal Article · Tue Jul 01 00:00:00 EDT 2014 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:22314475