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Title: Ultraviolet GaN photodetectors on Si via oxide buffer heterostructures with integrated short period oxide-based distributed Bragg reflectors and leakage suppressing metal-oxide-semiconductor contacts

Based on a novel double step oxide buffer heterostructure approach for GaN integration on Si, we present an optimized Metal-Semiconductor-Metal (MSM)-based Ultraviolet (UV) GaN photodetector system with integrated short-period (oxide/Si) Distributed Bragg Reflector (DBR) and leakage suppressing Metal-Oxide-Semiconductor (MOS) electrode contacts. In terms of structural properties, it is demonstrated by in-situ reflection high energy electron diffraction and transmission electron microscopy-energy dispersive x-ray studies that the DBR heterostructure layers grow with high thickness homogeneity and sharp interface structures sufficient for UV applications; only minor Si diffusion into the Y{sub 2}O{sub 3} films is detected under the applied thermal growth budget. As revealed by comparative high resolution x-ray diffraction studies on GaN/oxide buffer/Si systems with and without DBR systems, the final GaN layer structure quality is not significantly influenced by the growth of the integrated DBR heterostructure. In terms of optoelectronic properties, it is demonstrated that—with respect to the basic GaN/oxide/Si system without DBR—the insertion of (a) the DBR heterostructures and (b) dark current suppressing MOS contacts enhances the photoresponsivity below the GaN band-gap related UV cut-off energy by almost up to two orders of magnitude. Given the in-situ oxide passivation capability of grown GaN surfaces and the one order of magnitudemore » lower number of superlattice layers in case of higher refractive index contrast (oxide/Si) systems with respect to classical III-N DBR superlattices, virtual GaN substrates on Si via functional oxide buffer systems are thus a promising robust approach for future GaN-based UV detector technologies.« less
Authors:
 [1] ;  [2] ; ; ; ;  [1] ; ; ;  [3] ;  [1] ;  [4]
  1. IHP, Im Technologiepark 25, 15236 Frankfurt (Oder) (Germany)
  2. (Poland)
  3. Siltronic, Hanns-Seidel-Platz 4, 81737 München (Germany)
  4. (Germany)
Publication Date:
OSTI Identifier:
22314322
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 116; Journal Issue: 8; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DIFFUSION; ELECTRON DIFFRACTION; FILMS; GALLIUM NITRIDES; LAYERS; LEAKS; PASSIVATION; PHOTODETECTORS; REFLECTION; REFRACTIVE INDEX; RESOLUTION; SEMICONDUCTOR MATERIALS; SUBSTRATES; SUPERLATTICES; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X-RAY DIFFRACTION; YTTRIUM OXIDES