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Title: Voltage controlled biaxial strain in VO{sub 2} films grown on 0.72Pb(Mg{sub 1∕3}Nb{sub 2∕3})-0.28PbTiO{sub 3} crystals and its effect on the transition temperature

Vanadium oxide thin films (VO{sub 2}) were deposited on 0.72Pb(Mg{sub 1∕3}Nb{sub 2∕3})-0.28PbTiO{sub 3} (PMN-PT) crystalline substrates using pulsed laser deposition method. Due to their huge piezoelectric coefficients in the order of 2500 pm/V, the PMN-PT substrates are used to impose additional amount of biaxial strain to the VO{sub 2} films by applying an external bias to the substrates. The influence of the biaxial strain on the transition temperature and on the conductive properties of the VO{sub 2} films is investigated in this work. Thus, a change in the biaxial strain of −0.8 × 10{sup −3} applied in the (110) plane of the rutile cell of the VO{sub 2} lowered the metal-to-insulator transition temperature by 1.35 °C.
Authors:
; ;  [1]
  1. Nanoelektronik, Technische Fakultät, Christian-Albrechts-Universität zu Kiel, Kiel 24143 (Germany)
Publication Date:
OSTI Identifier:
22311352
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 105; Journal Issue: 9; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CRYSTALS; ELECTRIC POTENTIAL; ENERGY BEAM DEPOSITION; LASER RADIATION; LEAD COMPOUNDS; MAGNESIUM COMPOUNDS; METALS; NIOBIUM COMPOUNDS; PIEZOELECTRICITY; PULSED IRRADIATION; RUTILE; STRAINS; THIN FILMS; TITANATES; TRANSITION TEMPERATURE; VANADIUM OXIDES