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Title: A simple facile approach to large scale synthesis of high specific surface area silicon nanoparticles

Journal Article · · Journal of Solid State Chemistry
 [1];  [2];  [3];  [1]
  1. Department of Mechanical Engineering and Materials Science, University of Pittsburgh, Pittsburgh, PA 15261 (United States)
  2. Department of Chemical Engineering, Rowan University, Glassboro, NJ 08028 (United States)
  3. Department of Bioengineering, University of Pittsburgh, Pittsburgh, PA 15261 (United States)

An inexpensive, facile, and high throughput synthesis of silicon nanoparticles was achieved by the mechano-chemical reduction reaction of magnesium silicide (Mg{sub 2}Si) and silicon monoxide (SiO) using a high energy mechanical milling (HEMM) technique followed by acid leaching. Characterization of the resultant product using X-Ray diffraction, Raman spectroscopy, scanning electron microscopy (SEM), transmission electron microscopy (TEM) and surface area analyses was performed at various stages of the synthesis process. XRD patterns show that the final product formed is single phase silicon and the nanocrystalline nature was confirmed by the shifted transverse optical (TO) band, characteristic of nc-Si determined by Raman analysis. SEM and TEM shows the presence of particles of different sizes in the range of few nanometers to agglomerates of few microns which is consistent with products obtained from mechanical milling. BET measurements show a very high specific surface area (SSA) of ∼190 m{sup 2}/g obtained due to acid leaching which is also validated by the porous nature of the particles confirmed by the SEM images. - Graphical abstract: Schematic showing the large scale production of nanosized silicon and BET surface area of the product formed at various stages.

OSTI ID:
22309071
Journal Information:
Journal of Solid State Chemistry, Vol. 208; Other Information: Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0022-4596
Country of Publication:
United States
Language:
English