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Title: Performance of a size-selected nanocluster deposition facility and in situ characterization of grown films by x-ray photoelectron spectroscopy

We report here on a newly installed gas aggregation type nanocluster deposition unit based on magnetron sputtering ion source with mass selection of the clusters by quadrupole mass filter. The system is ultra high vacuum compatible and is equipped with an in situ X-ray Photoelectron Spectroscopy facility, giving compositional information of the films formed by nanoclusters deposition on a substrate. Detailed descriptions and working of the components of the system are presented. For the characterization of the nanocluster source and associated mass filter for size selected clusters, the dependence of output performance as a function of aggregation length, sputter gas flow and magnetron power of the cluster source have been studied. Copper nanoclusters deposited on Silicon (100) surface and on transmission electron microscope grids are, respectively, studied with scanning electron microscopy and transmission electron microscopy for the morphology.
Authors:
;  [1]
  1. Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata 700 064 (India)
Publication Date:
OSTI Identifier:
22308836
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 6; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; AGGLOMERATION; COPPER; GAS FLOW; ION SOURCES; MAGNETRONS; MORPHOLOGY; NANOSTRUCTURES; PRESSURE RANGE MICRO PA; SCANNING ELECTRON MICROSCOPY; SILICON; SPUTTERING; SURFACE COATING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY PHOTOELECTRON SPECTROSCOPY