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Title: Nanoscale mapping of the W/Si(001) Schottky barrier

The W/Si(001) Schottky barrier was spatially mapped with nanoscale resolution using ballistic electron emission microscopy (BEEM) and ballistic hole emission microscopy (BHEM) using n-type and p-type silicon substrates. The formation of an interfacial tungsten silicide is observed utilizing transmission electron microscopy and Rutherford backscattering spectrometry. The BEEM and BHEM spectra are fit utilizing a linearization method based on the power law BEEM model using the Prietsch Ludeke fitting exponent. The aggregate of the Schottky barrier heights from n-type (0.71 eV) and p-type (0.47 eV) silicon agrees with the silicon band gap at 80 K. Spatially resolved maps of the Schottky barrier are generated from grids of 7225 spectra taken over a 1 μm × 1 μm area and provide insight into its homogeneity. Histograms of the barrier heights have a Gaussian component consistent with an interface dipole model and show deviations that are localized in the spatial maps and are attributed to compositional fluctuations, nanoscale defects, and foreign materials.
Authors:
; ;  [1]
  1. College of Nanoscale Science and Engineering, State University of New York, Albany, New York 12203 (United States)
Publication Date:
OSTI Identifier:
22308725
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 116; Journal Issue: 2; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CRYSTAL DEFECTS; DIPOLES; ELECTRIC POTENTIAL; ELECTRON EMISSION; EV RANGE; FLUCTUATIONS; INTERFACES; NANOSTRUCTURES; N-TYPE CONDUCTORS; P-TYPE CONDUCTORS; RESOLUTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCHOTTKY BARRIER DIODES; SILICON; SPECTRA; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; TUNGSTEN SILICIDES