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Title: Growth-induced non-planar magnetic anisotropy in FeCoZr-CaF{sub 2} nanogranular films: Structural and magnetic characterization

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4891016· OSTI ID:22308550
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  1. NC PHEP Belarusian State University, 220040 Minsk (Belarus)
  2. Department of Solid State Physics, Faculty of Physics and Applied Computer Science, AGH University of Science and Technology, al. Mickiewicza 30, 30-059 Krakow (Poland)
  3. VINČA Institute of Nuclear Sciences, Belgrade University, P.O. Box 522, 11001 Belgrade (Serbia)

The relation between nanoscale structure, local atomic order and magnetic properties of (FeCoZr){sub x}(CaF{sub 2}){sub 100−x} (29 ≤ x ≤ 73 at. %) granular films is studied as a function of metal/insulator fraction ratio. The films of a thickness of 1–6 μm were deposited on Al-foils and glass-ceramic substrates, by ion sputtering of targets of different metal/insulator contents. Structural characterization with X-ray and electron diffraction as well as transmission electron microscopy revealed that the films are composed of isolated nanocrystalline bcc α-FeCo(Zr) alloy and insulating fcc CaF{sub 2} matrix. They grow in a columnar structure, where elongated metallic nanograins are arranged on top of each other within the columns almost normal to the substrate surface. Mössbauer spectroscopy and magnetometry results indicate that their easy magnetization axes are oriented at an angle of 65°–74° to the surface in films with x between 46 and 74, above the electrical percolation threshold, which is attributed to the growth-induced shape anisotropy. Interatomic distances characteristic for metallic state of α-FeCo(Zr) nanograins were revealed by X-ray Absorption Spectroscopy. The results show a lack of surface oxidation of the alloy nanograins, so the growth-induced orientation of nanograins in the films cannot be attributed to this effect. The study is among the first to report a growth-induced non-planar magnetic anisotropy in metal/insulator granular films above the percolation threshold and to reveal the origin of it.

OSTI ID:
22308550
Journal Information:
Journal of Applied Physics, Vol. 116, Issue 4; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English