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Title: Polycrystalline indium phosphide on silicon by indium assisted growth in hydride vapor phase epitaxy

Polycrystalline InP was grown on Si(001) and Si(111) substrates by using indium (In) metal as a starting material in hydride vapor phase epitaxy (HVPE) reactor. In metal was deposited on silicon substrates by thermal evaporation technique. The deposited In resulted in islands of different size and was found to be polycrystalline in nature. Different growth experiments of growing InP were performed, and the growth mechanism was investigated. Atomic force microscopy and scanning electron microscopy for morphological investigation, Scanning Auger microscopy for surface and compositional analyses, powder X-ray diffraction for crystallinity, and micro photoluminescence for optical quality assessment were conducted. It is shown that the growth starts first by phosphidisation of the In islands to InP followed by subsequent selective deposition of InP in HVPE regardless of the Si substrate orientation. Polycrystalline InP of large grain size is achieved and the growth rate as high as 21 μm/h is obtained on both substrates. Sulfur doping of the polycrystalline InP was investigated by growing alternating layers of sulfur doped and unintentionally doped InP for equal interval of time. These layers could be delineated by stain etching showing that enough amount of sulfur can be incorporated. Grains of large lateral dimension up tomore » 3 μm polycrystalline InP on Si with good morphological and optical quality is obtained. The process is generic and it can also be applied for the growth of other polycrystalline III–V semiconductor layers on low cost and flexible substrates for solar cell applications.« less
Authors:
; ;  [1] ;  [2] ; ;  [3]
  1. Laboratory of Semiconductor Materials, Department of Materials and Nano Physics, KTH—Royal Institute of Technology, Electrum 229, 164 40 Kista (Sweden)
  2. CNR-Institute for Photonics and Nanotechnologies, P. Leonardo da Vinci, 32 20133 Milano (Italy)
  3. Department of Physics Politecnico di Milano, P. Leonardo da Vinci, 32 20133 Milano (Italy)
Publication Date:
OSTI Identifier:
22308468
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 116; Journal Issue: 3; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; DEPOSITION; DOPED MATERIALS; EVAPORATION; GRAIN SIZE; INDIUM; INDIUM PHOSPHIDES; LAYERS; PHOTOLUMINESCENCE; POLYCRYSTALS; POWDERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SILICON; SOLAR CELLS; SUBSTRATES; SURFACES; VAPOR PHASE EPITAXY; X-RAY DIFFRACTION