Characterization on RF magnetron sputtered niobium pentoxide thin films

Journal Article · Wed Oct 15 00:00:00 EDT 2014 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.4898262· OSTI ID:22308015

Usha, N. ^[1]; Sanjeeviraja, C. ^[2]

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1. Department of Physics, Alagappa University, Karaikudi - 630 004 (India)
2. Department of Physics, Alagappa Chettiar College of Engineering and Technology, Karaikudi - 630 004 (India)

Niobium pentoxide (Nb{sub 2}O{sub 5}) thin films with amorphous nature were deposited on microscopic glass substrates at 100°C by rf magnetron sputtering technique. The effect of rf power on the structural, morphological, optical, and vibrational properties of Nb{sub 2}O{sub 5} films have been investigated. Optical study shows the maximum average transmittance of about 87% and the optical energy band gap (indirect allowed) changes between 3.70 eV and 3.47 eV. AFM result indicates the smooth surface nature of the samples. Photoluminescence measurement showed the better optical quality of the deposited films. Raman spectra show the LO-TO splitting of Nb-O stretching of Nb{sub 2}O{sub 5} films.

• OSTI ID: 22308015
• Journal Information: AIP Conference Proceedings, Vol. 1620, Issue 1; Conference: Optics 14: International conference on optics: Light and its interactions with matter, Calicut, Kerala (India), 19-21 Mar 2014; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMORPHOUS STATE
ATOMIC FORCE MICROSCOPY
EMISSION SPECTRA
ENERGY GAP
EV RANGE
GLASS
NIOBIUM OXIDES
OPACITY
PHOTOLUMINESCENCE
RAMAN SPECTRA
SPUTTERING
SUBSTRATES
SURFACES
THIN FILMS