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Title: Suppressing light reflection from polycrystalline silicon thin films through surface texturing and silver nanostructures

This work demonstrates a novel method combining ion implantation and silver nanostructures for suppressing light reflection from polycrystalline silicon thin films. Samples were implanted with 20-keV hydrogen ions to a dose of 10¹⁷/cm², and some of them received an additional argon ion implant to a dose of 5×10¹⁵ /cm² at an energy between 30 and 300 keV. Compared to the case with a single H implant, the processing involved both H and Ar implants and post-implantation annealing has created a much higher degree of surface texturing, leading to a more dramatic reduction of light reflection from polycrystalline Si films over a broadband range between 300 and 1200 nm, e.g., optical reflection from the air/Si interface in the AM1.5 sunlight condition decreasing from ~30% with an untextured surface to below 5% for a highly textured surface after post-implantation annealing at 1000°C. Formation of Ag nanostructures on these ion beam processed surfaces further reduces light reflection, and surface texturing is expected to have the benefit of diminishing light absorption losses within large-size (>100 nm) Ag nanoparticles, yielding an increased light trapping efficiency within Si as opposed to the case with Ag nanostructures on a smooth surface. A discussion of the effects ofmore » surface textures and Ag nanoparticles on light trapping within Si thin films is also presented with the aid of computer simulations.« less
Authors:
 [1] ; ; ; ; ;  [2]
  1. Department of Physics, University at Albany-SUNY, Albany, New York 12222 (United States)
  2. SUNY College of Nanoscale Science and Engineering, Albany, New York 12203 (United States)
Publication Date:
OSTI Identifier:
22305988
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 116; Journal Issue: 11; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABSORPTION; ANNEALING; ARGON IONS; COMPUTERIZED SIMULATION; EFFICIENCY; HYDROGEN IONS; INTERFACES; ION IMPLANTATION; NANOPARTICLES; NANOSTRUCTURES; OPTICAL REFLECTION; POLYCRYSTALS; SILICON; SILVER; SURFACES; TEXTURE; THIN FILMS; TRAPPING; VISIBLE RADIATION