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Title: Generation of uniform large-area very high frequency plasmas by launching two specific standing waves simultaneously

With the characteristics of higher electron density and lower ion bombardment energy, large-area VHF (very high frequency) plasma enhanced chemical vapor deposition has become an essential manufacturing equipment to improve the production throughput and efficiency of thin film silicon solar cell. However, the combination of high frequency and large electrodes leads to the so-called standing wave effect causing a serious problem for the deposition uniformity of silicon thin film. In order to address this issue, a technique based on the idea of simultaneously launching two standing waves that possess similar amplitudes and are out of phase by 90° in time and space is proposed in this study. A linear plasma reactor with discharge length of 54 cm is tested with two different frequencies including 60 and 80 MHz. The experimental results show that the proposed technique could effectively improve the non-uniformity of VHF plasmas from >±60% when only one standing wave is applied to <±10% once two specific standing waves are launched at the same time. Moreover, in terms of the reactor configuration adopted in this study, in which the standing wave effect along the much shorter dimension can be ignored, the proposed technique is applicable to different frequencies withoutmore » the need to alter the number and arrangement of power feeding points.« less
Authors:
; ; ;  [1] ;  [2]
  1. Physics Division, Institute of Nuclear Energy Research (INER), Longtan, Taoyuan County 32546, Taiwan (China)
  2. Department of Engineering and System Science, National Tsing Hua University, 101, Section 2, Kuang-Fu Road, Hsinchu 30013, Taiwan (China)
Publication Date:
OSTI Identifier:
22305933
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 116; Journal Issue: 10; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CHEMICAL VAPOR DEPOSITION; CONFIGURATION; EFFICIENCY; ELECTRON DENSITY; LAUNCHING; MANUFACTURING; PLASMA; SILICON; SILICON SOLAR CELLS; STANDING WAVES; THIN FILMS