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Title: Fabrication of moth-eye structures on silicon by direct six-beam laser interference lithography

This paper presents a new method for the generation of cross-scale laser interference patterns and the fabrication of moth-eye structures on silicon. In the method, moth-eye structures were produced on a surface of silicon wafer using direct six-beam laser interference lithography to improve the antireflection performance of the material surface. The periodic dot arrays of the moth-eye structures were formed due to the ablation of the irradiance distribution of interference patterns on the wafer surface. The shape, size, and distribution of the moth-eye structures can be adjusted by controlling the wavelength, incidence angles, and exposure doses in a direct six-beam laser interference lithography setup. The theoretical and experimental results have shown that direct six-beam laser interference lithography can provide a way to fabricate cross-scale moth-eye structures for antireflection applications.
Authors:
; ;  [1] ; ;  [1] ;  [2]
  1. CNM and JR3CN, Changchun University of Science and Technology, Changchun 130022 (China)
  2. (United Kingdom)
Publication Date:
OSTI Identifier:
22304383
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 20; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DISTRIBUTION; INCIDENCE ANGLE; INTERFERENCE; LASER RADIATION; PERIODICITY; RADIANT FLUX DENSITY; SILICON; SURFACES; WAVELENGTHS