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Title: Direct current dielectric barrier assistant discharge to get homogeneous plasma in capacitive coupled discharge

In this paper, we propose a method to get more homogeneous plasma in the geometrically asymmetric capacitive coupled plasma (CCP) discharge. The dielectric barrier discharge (DBD) is used for the auxiliary discharge system to improve the homogeneity of the geometrically asymmetric CCP discharge. The single Langmuir probe measurement shows that the DBD can increase the electron density in the low density volume, where the DBD electrodes are mounted, when the pressure is higher than 5 Pa. By this manner, we are able to improve the homogeneity of the plasma production and increase the overall density in the target volume. At last, the finite element simulation results show that the DC bias, applied to the DBD electrodes, can increase the homogeneity of the electron density in the CCP discharge. The simulation results show a good agreement with the experiment results.
Authors:
 [1] ;  [2] ;  [3] ; ; ; ;  [1]
  1. Modern Physics Department, University of Science and Technology of China, Hefei, Anhui 230026 (China)
  2. (Germany)
  3. Max-Planck Institute for Extraterrestrial Physics, D-85748 Garching (Germany)
Publication Date:
OSTI Identifier:
22304163
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 21; Journal Issue: 6; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ASYMMETRY; DIRECT CURRENT; ELECTRODES; ELECTRON DENSITY; FINITE ELEMENT METHOD; HOMOGENEOUS PLASMA; LANGMUIR PROBE; PLASMA PRODUCTION; SIMULATION