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Title: Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation

Single-pulse (532 nm, 8 ns) micropatterning of silicon with nanometric surface modulation is demonstrated by irradiating through a diffracting pinhole. The irradiation results obtained at fluences above the melting threshold are characterized by scanning electron and scanning force microscopy and reveal a good agreement with Fresnel diffraction theory. The physical mechanism is identified and discussed on basis of both thermocapillary and chemicapillary induced material transport during the molten state of the surface.
Authors:
; ; ;  [1] ; ;  [2] ;  [3]
  1. Departamento de Física, Universidad Autónoma Metropolitana Iztapalapa, Av. San Rafael Atlixco No. 186, Col. Vicentina, C.P. 09340 México D. F. (Mexico)
  2. Departamento de Química, Universidad Autónoma Metropolitana Iztapalapa, Av. San Rafael Atlixco No. 186, Col. Vicentina, C.P. 09340 México D. F. (Mexico)
  3. BAM Bundesanstalt für Materialforschung und-prüfung, Unter den Eichen 87, D-12205 Berlin (Germany)
Publication Date:
OSTI Identifier:
22304126
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 22; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; DIFFRACTION; ELECTRON SCANNING; IRRADIATION; LASER RADIATION; MELTING; MODULATION; NANOSTRUCTURES; PULSES; SILICON; SURFACES