Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation
Abstract
Single-pulse (532 nm, 8 ns) micropatterning of silicon with nanometric surface modulation is demonstrated by irradiating through a diffracting pinhole. The irradiation results obtained at fluences above the melting threshold are characterized by scanning electron and scanning force microscopy and reveal a good agreement with Fresnel diffraction theory. The physical mechanism is identified and discussed on basis of both thermocapillary and chemicapillary induced material transport during the molten state of the surface.
- Authors:
-
- Departamento de Física, Universidad Autónoma Metropolitana Iztapalapa, Av. San Rafael Atlixco No. 186, Col. Vicentina, C.P. 09340 México D. F. (Mexico)
- Departamento de Química, Universidad Autónoma Metropolitana Iztapalapa, Av. San Rafael Atlixco No. 186, Col. Vicentina, C.P. 09340 México D. F. (Mexico)
- BAM Bundesanstalt für Materialforschung und-prüfung, Unter den Eichen 87, D-12205 Berlin (Germany)
- Publication Date:
- OSTI Identifier:
- 22304126
- Resource Type:
- Journal Article
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Volume: 115; Journal Issue: 22; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; DIFFRACTION; ELECTRON SCANNING; IRRADIATION; LASER RADIATION; MELTING; MODULATION; NANOSTRUCTURES; PULSES; SILICON; SURFACES
Citation Formats
Haro-Poniatowski, E., E-mail: haro@xanum.uam.mx, Acosta-Zepeda, C., Mecalco, G., Hernández-Pozos, J. L., Batina, N., Morales-Reyes, I., and Bonse, J. Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation. United States: N. p., 2014.
Web. doi:10.1063/1.4882660.
Haro-Poniatowski, E., E-mail: haro@xanum.uam.mx, Acosta-Zepeda, C., Mecalco, G., Hernández-Pozos, J. L., Batina, N., Morales-Reyes, I., & Bonse, J. Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation. United States. https://doi.org/10.1063/1.4882660
Haro-Poniatowski, E., E-mail: haro@xanum.uam.mx, Acosta-Zepeda, C., Mecalco, G., Hernández-Pozos, J. L., Batina, N., Morales-Reyes, I., and Bonse, J. 2014.
"Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation". United States. https://doi.org/10.1063/1.4882660.
@article{osti_22304126,
title = {Diffraction-assisted micropatterning of silicon surfaces by ns-laser irradiation},
author = {Haro-Poniatowski, E., E-mail: haro@xanum.uam.mx and Acosta-Zepeda, C. and Mecalco, G. and Hernández-Pozos, J. L. and Batina, N. and Morales-Reyes, I. and Bonse, J.},
abstractNote = {Single-pulse (532 nm, 8 ns) micropatterning of silicon with nanometric surface modulation is demonstrated by irradiating through a diffracting pinhole. The irradiation results obtained at fluences above the melting threshold are characterized by scanning electron and scanning force microscopy and reveal a good agreement with Fresnel diffraction theory. The physical mechanism is identified and discussed on basis of both thermocapillary and chemicapillary induced material transport during the molten state of the surface.},
doi = {10.1063/1.4882660},
url = {https://www.osti.gov/biblio/22304126},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 22,
volume = 115,
place = {United States},
year = {Sat Jun 14 00:00:00 EDT 2014},
month = {Sat Jun 14 00:00:00 EDT 2014}
}
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