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Title: Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods

Abstract

An efficient electrical spin injection into an InGaAs/GaAs quantum well light emitting diode is demonstrated thanks to a CoFeB/MgO spin injector. The textured MgO tunnel barrier is fabricated by two different techniques: sputtering and molecular beam epitaxy. The maximal spin injection efficiency is comparable for both methods. Additionally, the effect of annealing is also investigated for the two types of samples. Both samples show the same trend: an increase of the electroluminescence circular polarization (P{sub c}) with the increase of annealing temperature, followed by a saturation of P{sub c} beyond 350 °C annealing. Since the increase of P{sub c} starts well below the crystallization temperature of the full CoFeB bulk layer, this trend could be mainly due to an improvement of chemical structure at the top CoFeB/MgO interface. This study reveals that the control of CoFeB/MgO interface is essential for an optimal spin injection into semiconductor.

Authors:
; ; ; ; ;  [1]; ; ; ; ; ; ;  [2]; ;  [3];  [4];  [5];  [6]
  1. Université de Toulouse, INSA-CNRS-UPS, LPCNO, 135 avenue de Rangueil, 31077 Toulouse (France)
  2. Unité Mixte de Physique CNRS/Thales and Université Paris-Sud 11, 1 avenue A. Fresnel, 91767 Palaiseau (France)
  3. Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083 (China)
  4. Institut des NanoSciences de Paris, UPMC, CNRS UMR 7588, 4 place Jussieu, 75005 Paris (France)
  5. Institut Jean Lamour, UMR 7198, CNRS-Nancy Université, BP 239, 54506 Vandoeuvre (France)
  6. Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P.O. Box 603, Beijing 100190 (China)
Publication Date:
OSTI Identifier:
22303946
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 105; Journal Issue: 1; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANNEALING; CRYSTALLIZATION; EFFICIENCY; ELECTROLUMINESCENCE; GALLIUM ARSENIDES; INDIUM ARSENIDES; INDIUM COMPOUNDS; INJECTION; INTERFACES; LAYERS; LIGHT EMITTING DIODES; MAGNESIUM OXIDES; MOLECULAR BEAM EPITAXY; POLARIZATION; QUANTUM WELLS; SATURATION; SEMICONDUCTOR MATERIALS; SPIN; SPUTTERING

Citation Formats

Barate, P., Zhang, T. T., Vidal, M., Renucci, P., Marie, X., Amand, T., Liang, S., Devaux, X., Hehn, M., Mangin, S., Lu, Y., E-mail: yuan.lu@univ-lorraine.fr, Frougier, J., Jaffrès, H., George, J. M., Xu, B., Wang, Z., Zheng, Y., Tao, B., Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P.O. Box 603, Beijing 100190, and Han, X. F. Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods. United States: N. p., 2014. Web. doi:10.1063/1.4887347.
Barate, P., Zhang, T. T., Vidal, M., Renucci, P., Marie, X., Amand, T., Liang, S., Devaux, X., Hehn, M., Mangin, S., Lu, Y., E-mail: yuan.lu@univ-lorraine.fr, Frougier, J., Jaffrès, H., George, J. M., Xu, B., Wang, Z., Zheng, Y., Tao, B., Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P.O. Box 603, Beijing 100190, & Han, X. F. Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods. United States. https://doi.org/10.1063/1.4887347
Barate, P., Zhang, T. T., Vidal, M., Renucci, P., Marie, X., Amand, T., Liang, S., Devaux, X., Hehn, M., Mangin, S., Lu, Y., E-mail: yuan.lu@univ-lorraine.fr, Frougier, J., Jaffrès, H., George, J. M., Xu, B., Wang, Z., Zheng, Y., Tao, B., Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P.O. Box 603, Beijing 100190, and Han, X. F. 2014. "Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods". United States. https://doi.org/10.1063/1.4887347.
@article{osti_22303946,
title = {Electrical spin injection into InGaAs/GaAs quantum wells: A comparison between MgO tunnel barriers grown by sputtering and molecular beam epitaxy methods},
author = {Barate, P. and Zhang, T. T. and Vidal, M. and Renucci, P. and Marie, X. and Amand, T. and Liang, S. and Devaux, X. and Hehn, M. and Mangin, S. and Lu, Y., E-mail: yuan.lu@univ-lorraine.fr and Frougier, J. and Jaffrès, H. and George, J. M. and Xu, B. and Wang, Z. and Zheng, Y. and Tao, B. and Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P.O. Box 603, Beijing 100190 and Han, X. F.},
abstractNote = {An efficient electrical spin injection into an InGaAs/GaAs quantum well light emitting diode is demonstrated thanks to a CoFeB/MgO spin injector. The textured MgO tunnel barrier is fabricated by two different techniques: sputtering and molecular beam epitaxy. The maximal spin injection efficiency is comparable for both methods. Additionally, the effect of annealing is also investigated for the two types of samples. Both samples show the same trend: an increase of the electroluminescence circular polarization (P{sub c}) with the increase of annealing temperature, followed by a saturation of P{sub c} beyond 350 °C annealing. Since the increase of P{sub c} starts well below the crystallization temperature of the full CoFeB bulk layer, this trend could be mainly due to an improvement of chemical structure at the top CoFeB/MgO interface. This study reveals that the control of CoFeB/MgO interface is essential for an optimal spin injection into semiconductor.},
doi = {10.1063/1.4887347},
url = {https://www.osti.gov/biblio/22303946}, journal = {Applied Physics Letters},
issn = {0003-6951},
number = 1,
volume = 105,
place = {United States},
year = {Mon Jul 07 00:00:00 EDT 2014},
month = {Mon Jul 07 00:00:00 EDT 2014}
}