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Title: A nitrogen doped low-dislocation density free-standing single crystal diamond plate fabricated by a lift-off process

A nitrogen-doped single crystal diamond plate with a low dislocation density is fabricated by chemical vapor deposition (CVD) from a high pressure high temperature synthetic type IIa seed substrate by ion implantation and lift-off processes. To avoid sub-surface damage, the seed surface was subjected to deep ion beam etching. In addition, we introduced a nitrogen flow during the CVD step to grow low-strain diamond at a relatively high growth rate. This resulted in a plate with low birefringence and a dislocation density as low as 400 cm{sup −2}, which is the lowest reported value for a lift-off plate. Reproducing this lift-off process may allow mass-production of single crystal CVD diamond plates with low dislocation density and consistent quality.
Authors:
; ; ; ; ;  [1]
  1. Research Institute for Ubiquitous Energy Devices, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577 (Japan)
Publication Date:
OSTI Identifier:
22303858
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 104; Journal Issue: 25; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BEAMS; BIREFRINGENCE; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; DAMAGE; DIAMONDS; DISLOCATIONS; DOPED MATERIALS; ETCHING; MASS; MONOCRYSTALS; NITROGEN ADDITIONS; STRAINS; SUBSTRATES; SURFACES