skip to main content

Title: On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

In this study, we attempted to determine the possibility of multiple inductively coupled plasma (ICP) and helicon plasma sources for large-area processes. Experiments were performed with the one and two coils to measure plasma and electrical parameters, and a circuit simulation was performed to measure the current at each coil in the 2-coil experiment. Based on the result, we could determine the possibility of multiple ICP sources due to a direct change of impedance due to current and saturation of impedance due to the skin-depth effect. However, a helicon plasma source is difficult to adapt to the multiple sources due to the consistent change of real impedance due to mode transition and the low uniformity of the B-field confinement. As a result, it is expected that ICP can be adapted to multiple sources for large-area processes.
Authors:
; ;  [1] ;  [2]
  1. Low-temperature Plasma Laboratory, Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 305-701 (Korea, Republic of)
  2. Agency of Defense Development, Yuseong-gu, Daejeon 305-151 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22303802
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 21; Journal Issue: 8; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; CONFINEMENT; CURRENTS; DEPTH; IMPEDANCE; PLASMA; SATURATION; SIMULATION