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Title: Wet chemical thinning of molybdenum disulfide down to its monolayer

We report on the preparation of mono- and bi-layer molybdenum disulfide (MoS{sub 2}) from a bulk crystal by facile wet chemical etching. We show that concentrated nitric acid (HNO{sub 3}) effectively etches thin MoS{sub 2} crystals from their edges via formation of MoO{sub 3}. Interestingly, etching of thin crystals on a substrate leaves behind unreacted mono- and bilayer sheets. The flakes obtained by chemical etching exhibit electronic quality comparable to that of mechanically exfoliated counterparts. Our findings indicate that the self-limiting chemical etching is a promising top-down route to preparing atomically thin crystals from bulk layer compounds.
Authors:
 [1] ; ;  [2] ;  [3] ;  [2] ;  [1] ;  [3] ;  [3]
  1. Department of Chemistry, National University of Singapore, 3 Science Drive 3, Singapore 117543 (Singapore)
  2. Department of Physics, National University of Singapore, 2 Science Drive 3, Singapore 117551 (Singapore)
  3. (Singapore)
Publication Date:
OSTI Identifier:
22303563
Resource Type:
Journal Article
Resource Relation:
Journal Name: APL Materials; Journal Volume: 2; Journal Issue: 9; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CRYSTALS; ETCHING; LAYERS; MOLYBDENUM OXIDES; MOLYBDENUM SULFIDES; NITRIC ACID; SUBSTRATES