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Title: Research Update: Reactively sputtered nanometer-thin ZrN film as a diffusion barrier between Al and boron layers for radiation detector applications

In this paper, optimization of the process flow for PureB detectors is investigated. Diffusion barrier layers between a boron layer and the aluminum interconnect can be used to enhance the performance and visual appearance of radiation detectors. Few nanometers-thin Zirconium Nitride (ZrN) layer deposited by reactive sputtering in a mixture of Ar/N{sub 2}, is identified as a reliable diffusion barrier with better fabrication process compatibility than others. The barrier properties of this layer have been tested for different boron layers deposited at low and high temperatures with extensive optical microscopy analyses, electron beam induced current, SEM, and electrical measurements. This study demonstrated that spiking behavior of pure Al on Si can be prevented by the thin ZrN layer thus improving the performance of the radiation detectors fabricated using boron layer.
Authors:
; ; ; ;  [1]
  1. ECTM, DIMES, Faculty of Electrical Engineering (EWI), Delft University of Technology (TU Delft), Feldmannweg 17, P.O. Box 5053, 2628 CT Delft (Netherlands)
Publication Date:
OSTI Identifier:
22303403
Resource Type:
Journal Article
Resource Relation:
Journal Name: APL Materials; Journal Volume: 2; Journal Issue: 10; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM; BORON; DEPOSITS; DIFFUSION BARRIERS; FILMS; LAYERS; MIXTURES; OPTICAL MICROSCOPY; RADIATION DETECTORS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; ZIRCONIUM; ZIRCONIUM NITRIDES