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Title: Deposition and characterization of molybdenum thin films using dc-plasma magnetron sputtering

Molebdenum (Mo) thin films were deposited on well-cleaned soda-lime glass substrates using DC-plasma magnetron sputtering. In the design of experiment deposition was optimized for maximum beneficial characteristics by monitoring effect of process variables such as deposition power (100–200 W). Their electrical, structural and morphological properties were analyzed to study the effect of these variables. The electrical resistivity of Mo thin films could be reduced by increasing deposition power. Within the range of analyzed deposition power, Mo thin films showed a mono crystalline nature and the crystallites were found to have an orientation along [110] direction. The surface morphology of thin films showed that a highly dense micro structure has been obtained. The surface roughness of films increased with deposition power. The adhesion of Mo thin films could be improved by increasing the deposition power. Atomic force microscopy was used for the topographical study of the films and to determine the roughness of the films. X-ray diffractrometer and scanning electron microscopy analysis were used to investigate the crystallinity and surface morphology of the films. Hall effect measurement system was used to find resistivity, carrier mobility and carrier density of deposited films. The adhesion test was performed using scotch hatch tape adhesionmore » test. Mo thin films prepared at deposition power of 200 W, substrate temperature of 23°C and Ar pressure of 0.0123 mbar exhibited a mono crystalline structure with an orientation along (110) direction, thickness of ∼550 nm and electrical resistivity value of 0.57 × 10{sup −4} Ω cm.« less
Authors:
 [1] ;  [2]
  1. National University of Sciences and Technology, School of Chemical and Materials Engineering (Pakistan)
  2. King Saud University, Center of Excellence for Research in Engineering Materials, Advanced Manufacturing Institute (Saudi Arabia)
Publication Date:
OSTI Identifier:
22300420
Resource Type:
Journal Article
Resource Relation:
Journal Name: Semiconductors; Journal Volume: 47; Journal Issue: 12; Other Information: Copyright (c) 2013 Pleiades Publishing, Ltd.; http://www.springer-ny.com; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ADHESION; ATOMIC FORCE MICROSCOPY; CARRIER DENSITY; DEPOSITION; DEPOSITS; ELECTRIC CONDUCTIVITY; HALL EFFECT; MAGNETRONS; MICROSTRUCTURE; MOLYBDENUM; PLASMA; SCANNING ELECTRON MICROSCOPY; SODIUM CARBONATES; SPUTTERING; SUBSTRATES; SURFACES; THICKNESS; THIN FILMS; X RADIATION