On the sol-gel synthesis of strontium-titanate thin films and the prospects of their use in electronics

Journal Article · Mon Dec 15 00:00:00 EST 2014 · Semiconductors

DOI:https://doi.org/10.1134/S1063782614120215· OSTI ID:22300396

Sohrabi Anaraki, H.; Rudenko, M. V.; Guk, A. F.; Zavadskij, S. M.; Golosov, D. A.; Kolosnitsyn, B. S. ^[1]; Kolos, V. V.; Pyatlitskij, A. N.; Turtsevich, A. S. ^[2]

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1. Belarusian State University of Informatics and Radioelectronics (Belarus)
2. Integral Enterprise (Belarus)

Strontium-titanate films obtained by the sol-gel technique are deposited onto silicon and silicon/oxide titanium/platinum substrates. The strontium-titanate phase is detected by the method of X-ray diffraction analysis after heat treatment at temperatures of 750 and 800°C. The thickness of the films obtained by the spin-on method increases from 50 to 250 nm as the number of deposited layers is increased and is accompanied with an increase in the grain size in the films. Prospects of the development of the sol-gel technique for the formation of film components of electronic devices based on SrTiO{sub 3} xerogels are discussed.

• OSTI ID: 22300396
• Journal Information: Semiconductors, Vol. 48, Issue 12; Other Information: Copyright (c) 2014 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
DEPOSITS
ELECTRONIC EQUIPMENT
GRAIN SIZE
PLATINUM
SILICON
SILICON OXIDES
SOL-GEL PROCESS
SPIN
STRONTIUM
STRONTIUM TITANATES
SUBSTRATES
SYNTHESIS
THIN FILMS
TITANIUM
X-RAY DIFFRACTION