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Title: Tuning the work function of graphene by nitrogen plasma treatment with different radio-frequency powers

Graphene prepared by the chemical vapor deposition method was treated with nitrogen plasma under different radio-frequency (rf) power conditions in order to experimentally study the change in the work function. Control of the rf power could change the work function of graphene from 4.91‚ÄČeV to 4.37‚ÄČeV. It is shown that the increased rf power may lead to the increased number of graphitic nitrogen, increasing the electron concentration, and shifting the Fermi level to higher energy. The ability to controllably tune the work function of graphene is essential for optimizing the efficiency of optoelectronic and electronic devices.
Authors:
;  [1]
  1. Institute of Photonics, National Changhua University of Education, Changhua 500, Taiwan (China)
Publication Date:
OSTI Identifier:
22300050
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 104; Journal Issue: 23; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY; CHEMICAL VAPOR DEPOSITION; EFFICIENCY; ELECTRONIC EQUIPMENT; EV RANGE; FERMI LEVEL; GRAPHENE; GRAPHITE; NITROGEN; OPTIMIZATION; PLASMA; RADIOWAVE RADIATION; WORK FUNCTIONS