Photoresponse in thin films of WO{sub 3} grown by pulsed laser deposition

Journal Article · Mon Jun 09 00:00:00 EDT 2014 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4882658· OSTI ID:22300030

Roy Moulik, Samik ^[1]; Samanta, Sudeshna; Ghosh, Barnali ^[1]

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1. Unit for Nanoscience, Department of Condensed Matter Physics and Material Sciences, S. N. Bose National Centre for Basic Sciences, Kolkata (India)

We report, the photoresponse behaviour of Tungsten trioxide (WO{sub 3}) films of different surface morphology, grown by using pulsed laser deposition (PLD). The Growth parameters for PLD were changed for two substrates SiO{sub 2}/Si (SO) and SrTiO{sub 3} (STO), such a way which, result nanocrystalline film on SO and needle like structured film on STO. The photoresponse is greatly modified in these two films because of two different surface morphologies. The nanocrystalline film (film on SO) shows distinct photocurrent (PC) ON/OFF states when light was turned on/off, the enhancement of PC is ∼27%. Whereas, the film with needle like structure (film on STO) exhibits significantly enhanced persistent photocurrent even in light off condition, in this case, the enhancement of PC ∼ 50% at room temperature at lowest wavelength (λ = 360 nm) at a nominal bias voltage of 0.1 V.

• OSTI ID: 22300030
• Journal Information: Applied Physics Letters, Vol. 104, Issue 23; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CRYSTALS
ELECTRIC POTENTIAL
ENERGY BEAM DEPOSITION
LASER RADIATION
NANOSTRUCTURES
PULSED IRRADIATION
SILICON
SILICON OXIDES
STRONTIUM TITANATES
SUBSTRATES
SURFACES
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
TUNGSTATES
TUNGSTEN OXIDES
VISIBLE RADIATION
WAVELENGTHS