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Title: Hydrogen-doping stabilized metallic VO{sub 2} (R) thin films and their application to suppress Fabry-Perot resonances in the terahertz regime

We demonstrate that catalyst-assisted hydrogen spillover doping of VO{sub 2} thin films significantly alters the metal-insulator transition characteristics and stabilizes the metallic rutile phase at room temperature. With hydrogen inserted into the VO{sub 2} lattice, high resolution X-ray diffraction reveals expansion of the V-V chain separation when compared to the VO{sub 2}(R) phase. The donated free electrons, possibly from O-H bond formation, stabilize the VO{sub 2}(R) to low temperatures. By controlling the amount of dopants to obtain mixed insulating and metallic phases, VO{sub 2} resistivity can be continuously tuned until a critical condition is achieved that suppresses Fabry-Perot resonances. Our results demonstrate that hydrogen spillover is an effective technique to tune the electrical and optical properties of VO{sub 2} thin films.
Authors:
; ; ;  [1] ;  [2] ;  [3]
  1. Department of Electrical and Computer Engineering and Nano Tech Center, Lubbock, Texas 79409 (United States)
  2. Department of Physics and Nano Tech Center, Lubbock, Texas 79409 (United States)
  3. Department of Physics and MSEC, Texas State University, San Marcos, Texas 78666 (United States)
Publication Date:
OSTI Identifier:
22299882
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 104; Journal Issue: 24; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CATALYSTS; DOPED MATERIALS; ELECTRICAL PROPERTIES; EXPANSION; FABRY-PEROT INTERFEROMETER; HYDROGEN ADDITIONS; METALS; OPTICAL PROPERTIES; RESOLUTION; RESONANCE; RUTILE; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; VANADIUM OXIDES; X-RAY DIFFRACTION